Facility

facilities

Ultrafast optical and THz measurement

optical
– Ultrafast Ti:Sapphire regenerative amplifier system (~ 50 fs, Coherent RegA 9050)
– Tunable, Infrared (1 µm ~ 2 µm), ultrafast optical parametric amplifier (OPA)
– Tunable, mid-infrared (3 µm ~ 6 µm), ultrafast difference frequency generator (DFG)

Photoresponse and photocurrent measurement

Probe station
– Spatially (~ 1 µm) and temporally (~ 100 fs) resolved scanning-photocurrent microscopy
– Broadband continuum laser source (400 nm ~ 2,400 nm)
– Various CW diode lasers

Nanodevice fabrication and processing

fab
– Mask-aligner with 1μm of alignment accuracy (MDA-400M)
– Reactive Ion Etcher (Ar, O2, SF6, CF4)
– Thermal Evaporator system with thickness measurement (QCM)